Toyama, Nobuhito: search on Z-Library

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1

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, CA (Monday 14 September 2009)] Photomask Technology 2009 - 6-inch circle template fabrication for patterned media using a conventional resist and new chemically amplified resists

Hoga, Morihisa, Zurbrick, Larry S., Montgomery, M. Warren, Fukuda, Masaharu, Chiba, Tsuyoshi, Ishikawa, Mikio, Itoh, Kimio, Kurihara, Masaaki, Toyama, Nobuhito, Hayashi, Naoya

Year:

2009

Language:

english

File:

PDF, 13.39 MB

english, 2009

2

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California (Monday 13 September 2010)] Photomask Technology 2010 - 6-inch circle template fabrication for patterned media

Itoh, Kimio, Montgomery, M. Warren, Maurer, Wilhelm, Hoga, Morihisa, Toyama, Nobuhito

Year:

2010

Language:

english

File:

PDF, 4.72 MB

english, 2010

3

SPIE Proceedings [SPIE 24th European Mask and Lithography Conference - Dresden, Germany (Monday 21 January 2008)] 24th European Mask and Lithography Conference - Mask CD measurement approach by diffraction intensity for lithography equivalent

Nagai, Takaharu, Mesuda, Kei, Sutou, Takanori, Inazuki, Yuichi, Hashimoto, Hiroyuki, Yokoyama, Toshifumi, Toyama, Nobuhito, Morikawa, Yasutaka, Mohri, Hiroshi, Hayashi, Naoya

Year:

2008

Language:

english

File:

PDF, 1.97 MB

english, 2008

4

SPIE Proceedings [SPIE Photomask and Next-Generation Lithography Mask Technology XIV - Yokohama, Japan (Tuesday 17 April 2007)] Photomask and Next-Generation Lithography Mask Technology XIV - Extendibility of single mask exposure for practical ArF immersion lithography

Adachi, Takashi, Watanabe, Hidehiro, Inazuki, Yuichi, Sutou, Takanori, Nagai, Takaharu, Toyama, Nobuhito, Morikawa, Yasutaka, Mohri, Hiroshi, Hayashi, Naoya

Year:

2007

Language:

english

File:

PDF, 392 KB

english, 2007

5

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology IX - Yokohama, Japan (Tuesday 23 April 2002)] Photomask and Next-Generation Lithography Mask Technology IX - Optimization of Alt-PSM structure for 100-nm-node ArF lithography: II

Mesuda, Kei, Toyama, Nobuhito, Narukawa, Syogo, Morikawa, Yasutaka, Mohri, Hiroshi, Hayashi, Naoya, Hoga, Morihisa, Kawahira, Hiroichi

Year:

2002

Language:

english

File:

PDF, 356 KB

english, 2002

6

SPIE Proceedings [SPIE 24th European Mask and Lithography Conference - Dresden, Germany (Monday 21 January 2008)] 24th European Mask and Lithography Conference - Controlling linewidth roughness in step and flash imprint lithography

Schmid, Gerard M., Khusnatdinov, Niyaz, Brooks, Cynthia B., LaBrake, Dwayne, Thompson, Ecron, Resnick, Douglas J., Owens, Jordan, Ford, Arnie, Sasaki, Shiho, Toyama, Nobuhito, Kurihara, Masaaki, Hayas

Year:

2008

Language:

english

File:

PDF, 698 KB

english, 2008

7

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Design for Manufacturability through Design-Process Integration II - Decomposition difficulty analysis for double patterning and the impact on photomask manufacturability

Inazuki, Yuichi, Singh, Vivek K., Rieger, Michael L., Toyama, Nobuhito, Nagai, Takaharu, Sutou, Takanori, Morikawa, Yasutaka, Mohri, Hiroshi, Hayashi, Naoya, Drapeau, Martin, Lucas, Kevin, Cork, Chris

Year:

2008

Language:

english

File:

PDF, 262 KB

english, 2008

8

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XII - Yokohama, Japan (Wednesday 13 April 2005)] Photomask and Next-Generation Lithography Mask Technology XII - Photomask process development for next generation lithography

Sasaki, Shiho, Komuro, Masanori, Itoh, Kimio, Fujii, Akiko, Toyama, Nobuhito, Mohri, Hiroshi, Hayashi, Naoya

Year:

2005

Language:

english

File:

PDF, 579 KB

english, 2005

9

SPIE Proceedings [SPIE European Mask and Lithography Conf 2007 - Grenoble, France (Monday 22 January 2007)] 23rd European Mask and Lithography Conference - Characteristics optimization of mask materials for hyper-NA lithography

Morikawa, Yasutaka, Suto, Takanori, Nagai, Takaharu, Inazuki, Yuichi, Adachi, Takashi, Kitahata, Yasuhisa, Yokoyama, Toshifumi, Toyama, Nobuhito, Mohri, Hiroshi, Hayashi, Naoya

Year:

2007

Language:

english

File:

PDF, 238 KB

english, 2007

10

SPIE Proceedings [SPIE 26th Annual BACUS Symposium on Photomask Technology - Monterey, CA (Monday 18 September 2006)] Photomask Technology 2006 - NIL template making and imprint evaluation

Yoshida, Yuuichi, Martin, Patrick M., Naber, Robert J., Kobiki, Ayumi, Hiraka, Takaaki, Yusa, Satoshi, Sasaki, Shiho, Itoh, Kimio, Toyama, Nobuhito, Kurihara, Masaaki, Mohri, Hiroshi, Hayashi, Naoya

Year:

2006

Language:

english

File:

PDF, 1.13 MB

english, 2006

11

SPIE Proceedings [SPIE 27th Annual BACUS Symposium on Photomask Technology - Monterey, CA (Monday 17 September 2007)] Photomask Technology 2007 - DPL performance analysis strategy with conventional workflow

Toyama, Nobuhito, Naber, Robert J., Kawahira, Hiroichi, Inazuki, Yuichi, Sutou, Takanori, Nagai, Takaharu, Morikawa, Yasutaka, Mohri, Hiroshi, Hayashi, Naoya, Miyazaki, Junji, Chen, Alek, Samarakone,

Year:

2007

Language:

english

File:

PDF, 286 KB

english, 2007

12

10.4139/sfj.55.880

TOYAMA, Nobuhito

Journal:

Journal of The Surface Finishing Society of Japan

Year:

2004

File:

PDF, 1.24 MB

2004

13

Fra-1/AP-1 Impairs Inflammatory Responses and Chondrogenesis in Fracture Healing

Toru Yamaguchi, Yasunari Takada, Kenta Maruyama, Kouji Shimoda, Yoshinori Arai, Nobuhito Nango, Naoto Kosaki, Hironari Takaishi, Yoshiaki Toyama, Koichi Matsuo

Journal:

Journal of Bone and Mineral Research

Year:

2009

Language:

english

File:

PDF, 2.54 MB

english, 2009

14

Novel Method for Analyzing Locomotor Ability After Spinal Cord Injury in Rats: Technical Note

SHINOZAKI, Munehisa, YASUDA, Akimasa, NORI, Satoshi, SAITO, Nobuhito, TOYAMA, Yoshiaki, OKANO, Hideyuki, NAKAMURA, Masaya

Journal:

Neurologia medico-chirurgica

Year:

2013

Language:

english

File:

PDF, 1.22 MB

english, 2013

15

SPIE Proceedings [SPIE 27th Annual BACUS Symposium on Photomask Technology - Monterey, CA (Monday 17 September 2007)] Photomask Technology 2007 - Estimating DPL photomask fabrication load compared with single exposure

Toyama, Nobuhito, Naber, Robert J., Kawahira, Hiroichi, Inazuki, Yuichi, Sutou, Takanori, Nagai, Takaharu, Morikawa, Yasutaka, Mohri, Hiroshi, Hayashi, Naoya, Huckabay, Judy A., Abe, Yoshikuni

Year:

2007

Language:

english

File:

PDF, 215 KB

english, 2007

16

Generation of a doughnut-shaped beam using a spiral phase plate

Watanabe, Takeshi, Fujii, Masaaki, Watanabe, Yoshi, Toyama, Nobuhito, Iketaki, Yoshinori

Journal:

Review of Scientific Instruments

Year:

2004

Language:

english

File:

PDF, 764 KB

english, 2004

17

Novel Concept of Motor Functional Analysis for Spinal Cord Injury in Adult Mice

Shinozaki, Munehisa, Takahashi, Yuichiro, Mukaino, Masahiko, Saito, Nobuhito, Toyama, Yoshiaki, Okano, Hideyuki, Nakamura, Masaya

Journal:

Journal of Biomedicine and Biotechnology

Year:

2011

Language:

english

File:

PDF, 981 KB

english, 2011

18

SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Wednesday 13 September 2000)] 20th Annual BACUS Symposium on Photomask Technology - Improvement of the efficiency of OPC data handling

Toyama, Nobuhito, Ikemoto, Takayuki, Ishida, Kouji, Miyashita, Hiroyuki, Grenon, Brian J., Dao, Giang T.

Year:

2001

Language:

english

File:

PDF, 109 KB

english, 2001

19

SPIE Proceedings [SPIE Photomask and Next-Generation Lithography Mask Technology XIV - Yokohama, Japan (Tuesday 17 April 2007)] Photomask and Next-Generation Lithography Mask Technology XIV - Progress of NIL template making

Yusa, Satoshi, Hiraka, Takaaki, Kobiki, Ayumi, Sasaki, Shiho, Itoh, Kimio, Toyama, Nobuhito, Kurihara, Masaaki, Mohri, Hiroshi, Hayashi, Naoya, Watanabe, Hidehiro

Year:

2007

Language:

english

File:

PDF, 1.05 MB

english, 2007

20

SPIE Proceedings [SPIE Photomask and Next-Generation Lithography Mask Technology XIV - Yokohama, Japan (Tuesday 17 April 2007)] Photomask and Next-Generation Lithography Mask Technology XIV - Approach to analyze decomposition impact for photomask fabrication

Toyama, Nobuhito, Watanabe, Hidehiro, Adachi, Takashi, Inazuki, Yuichi, Sutou, Takanori, Nagai, Takaharu, Morikawa, Yasutaka, Mohri, Hiroshi, Hayashi, Naoya

Year:

2007

Language:

english

File:

PDF, 331 KB

english, 2007

21

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Optical Microlithography XX - Pupil plane analysis on AIMS 45-193i for advanced photomasks

Morikawa, Yasutaka, Flagello, Donis G., Sutou, Takanori, Mesuda, Kei, Nagai, Takaharu, Inazuki, Yuichi, Adachi, Takashi, Toyama, Nobuhito, Mohri, Hiroshi, Hayashi, Naoya, Stroessner, Ulrich, Birkner,

Year:

2007

Language:

english

File:

PDF, 606 KB

english, 2007

22

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology IX - Yokohama, Japan (Tuesday 23 April 2002)] Photomask and Next-Generation Lithography Mask Technology IX - Simulation-based defect printability analysis on attenuated phase-shifting masks

Pang, Linyong, Qian, Qi-De, Chan, Kevin K., Toyama, Nobuhito, Hayashi, Naoya, Kawahira, Hiroichi

Year:

2002

Language:

english

File:

PDF, 119 KB

english, 2002

23

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Optical Microlithography XX - Analysis of diffraction orders including mask topography effects for OPC optimization

Inazuki, Yuichi, Flagello, Donis G., Toyama, Nobuhito, Adachi, Takashi, Nagai, Takaharu, Suto, Takanori, Morikawa, Yasutaka, Mohri, Hiroshi, Hayashi, Naoya

Year:

2007

Language:

english

File:

PDF, 310 KB

english, 2007

24

SPIE Proceedings [SPIE 26th Annual BACUS Symposium on Photomask Technology - Monterey, CA (Monday 18 September 2006)] Photomask Technology 2006 - 45-32-nm node photomask technology with water immersion lithography

Adachi, Takashi, Martin, Patrick M., Naber, Robert J., Inazuki, Yuichi, Sutou, Takanori, Morikawa, Yasutaka, Toyama, Nobuhito, Mohri, Hiroshi, Hayashi, Naoya

Year:

2006

Language:

english

File:

PDF, 436 KB

english, 2006

25

SPIE Proceedings [SPIE Photomask and X-Ray Mask Technology VI - Yokohama, Japan (Tuesday 13 April 1999)] Photomask and X-Ray Mask Technology VI - Improvement of OPC data processing for photomask fabrication

Toyama, Nobuhito, Miyashita, Hiroyuki, Ishida, Kouji, Morimoto, Hiroaki

Year:

1999

Language:

english

File:

PDF, 636 KB

english, 1999

26

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XIII - Yokohama, Japan (Tuesday 18 April 2006)] Photomask and Next-Generation Lithography Mask Technology XIII - Dry etch technology development for NIL template

Yoshida, Yuuichi, Hoga, Morihisa, Amano, Tsuyoshi, Sasaki, Shiho, Itoh, Kimio, Toyama, Nobuhito, Mohri, Hiroshi, Hayashi, Naoya

Year:

2006

Language:

english

File:

PDF, 538 KB

english, 2006

27

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XIII - Yokohama, Japan (Tuesday 18 April 2006)] Photomask and Next-Generation Lithography Mask Technology XIII - Lithographic performance comparison with various RET for 45-nm node with hyper NA

Adachi, Takashi, Hoga, Morihisa, Inazuki, Yuichi, Sutou, Takanori, Kitahata, Yasuhisa, Morikawa, Yasutaka, Toyama, Nobuhito, Mohri, Hiroshi, Hayashi, Naoya

Year:

2006

Language:

english

File:

PDF, 315 KB

english, 2006

28

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XIII - Yokohama, Japan (Tuesday 18 April 2006)] Photomask and Next-Generation Lithography Mask Technology XIII - Optimization of source distribution for half-wavelength DOE

Horiguchi, Ryuji, Hoga, Morihisa, Toyama, Nobuhito, Itoh, Kimio, Yoshida, Kouji, Kurihara, Masaaki

Year:

2006

Language:

english

File:

PDF, 877 KB

english, 2006

29

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, CA (Monday 14 September 2009)] Photomask Technology 2009 - Study of program defects of 22nm nanoimprint template with an advanced e-beam inspection system

Hiraka, Takaaki, Zurbrick, Larry S., Montgomery, M. Warren, Mizuochi, Jun, Nakanishi, Yuko, Yusa, Satoshi, Sasaki, Shiho, Kurihara, Masaaki, Toyama, Nobuhito, Morikawa, Yasutaka, Mohri, Hiroshi, Hayas

Year:

2009

Language:

english

File:

PDF, 2.17 MB

english, 2009

30

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Design for Manufacturability through Design-Process Integration - Pattern decomposition for double patterning from photomask viewpoint

Toyama, Nobuhito, Wong, Alfred K. K., Singh, Vivek K., Adachi, Takashi, Inazuki, Yuichi, Sutou, Takanori, Morikawa, Yasutaka, Mohri, Hiroshi, Hayashi, Naoya

Year:

2007

Language:

english

File:

PDF, 6.15 MB

english, 2007

31

Comparison of quartz and silicon as a master mold substrate for patterned media UV-NIL replica process

Morihisa Hoga, Kimio Itoh, Mikio Ishikawa, Naoko Kuwahara, Masaharu Fukuda, Nobuhito Toyama, Syuhei Kurokawa, Toshiro Doi

Journal:

Microelectronic Engineering

Year:

2011

Language:

english

File:

PDF, 540 KB

english, 2011

32

SPIE Proceedings [SPIE 27th Annual BACUS Symposium on Photomask Technology - Monterey, CA (Monday 17 September 2007)] Photomask Technology 2007 - UV-NIL templates for the 22nm node and beyond

Hiraka, Takaaki, Naber, Robert J., Kawahira, Hiroichi, Yusa, Satoshi, Fujii, Akiko, Sasaki, Shiho, Itoh, Kimio, Toyama, Nobuhito, Kurihara, Masaaki, Mohri, Hiroshi, Hayashi, Naoya

Year:

2007

Language:

english

File:

PDF, 1.03 MB

english, 2007

33

SPIE Proceedings [SPIE Photomask Technology and Management - Monterey, CA (Wednesday 15 September 1999)] 19th Annual Symposium on Photomask Technology - Realization of practical attenuated phase-shift mask with high-transmission KrF excimer laser exposure

Toyama, Nobuhito, Miyashita, Hiroyuki, Morikawa, Yasutaka, Fujita, Hiroshi, Iwase, Kazuya, Mohri, Hiroshi, Hayashi, Naoya, Sano, Hisatake, Abboud, Frank E., Grenon, Brian J.

Year:

1999

Language:

english

File:

PDF, 301 KB

english, 1999

34

SPIE Proceedings [SPIE Integrated Optoelectronic Devices 2006 - San Jose, CA (Saturday 21 January 2006)] Photonic Crystal Materials and Devices IV - Evaluation of manufacturability for 3D photonic crystal waveguide with nanoimprint

Shimomura, Takeya, Adibi, Ali, Lin, Shawn-Yu, Ito, Kimio, Toyama, Nobuhito, Scherer, Axel

Year:

2006

Language:

english

File:

PDF, 2.17 MB

english, 2006

35

SPIE Proceedings [SPIE Photomask Technology 2005 - Monterey, California (Monday 3 October 2005)] 25th Annual BACUS Symposium on Photomask Technology - Optimization of Alt-PSM structure for 45nm node ArF immersion lithography

Adachi, Takashi, Weed, J. Tracy, Martin, Patrick M., Mesuda, Kei, Toyama, Nobuhito, Morikawa, Yasutaka, Mohri, Hiroshi, Hayashi, Naoya

Year:

2005

Language:

english

File:

PDF, 317 KB

english, 2005

36

Distinct roles of endogenous vascular endothelial factor receptor 1 and 2 in neural protection after spinal cord injury

Shinozaki, Munehisa, Nakamura, Masaya, Konomi, Tsunehiko, Kobayashi, Yoshiomi, Takano, Morito, Saito, Nobuhito, Toyama, Yoshiaki, Okano, Hideyuki

Journal:

Neuroscience Research

Year:

2014

Language:

english

File:

PDF, 3.78 MB

english, 2014

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